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Interfacial Reaction and Electrical Properties of HfO(2) Film Gate Dielectric Prepared by Pulsed Las
  • ISSN号：1944-8244
  • 期刊名称：ACS Applied Materials & Interfaces
  • 时间：2011.10.10
  • 页码：3813-3818
  • 相关项目：Ga掺杂ZnO纳米线阵列电极型量子点敏化太阳能电池的研究
作者： Wang, Yi|Wang, Hao|Ye, Cong|Zhang, Jun|Wang, Hanbin|Jiang, Yong|
同期刊论文项目
Ga掺杂ZnO纳米线阵列电极型量子点敏化太阳能电池的研究
期刊论文 16 专利 1
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