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？Prediction of the threshold load of dislocation emission in silicon during nanoscratching
  • ISSN号：1359-6454
  • 期刊名称：Acta Materialia
  • 时间：2013
  • 页码：5469-5476
  • 相关项目：含纳米团簇的铁素体合金高温强化与断裂机理研究
作者： Q.H. Fang|L.C. Zhang|
同期刊论文项目
含纳米团簇的铁素体合金高温强化与断裂机理研究
期刊论文 80
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