中文摘要：

讨论提出用连续的光源描述函数代替0～1分布的光源函数精确描述光源光强分布，以提高光刻分辨率．在SPIAT的基础上应用新的光源特征函数，建立新的光源模型，并结合测试模板进行仿真．结果显示，新的模型在精度上有较为明显的改善，新光源特征函数有助于建立更为精确的光刻模型．

英文摘要：

A new method for more accurate representation of the illumination source during OPC simulation and modeling was presented. The method involves using smooth functional representation of the illumination source instead of 0- 1 function. The new source function was used to build a new lithography model based on SPLAT. The test patterns were examined and it was shown that the new model is more accurate. Therefore, the smooth representation of the illumination source provides higher accuracy in lithography simulation.