A novel high performance TFS SJ IGBT with a buried oxide layer
ISSN号:1674-1056
期刊名称:《中国物理B:英文版》
时间:0
分类:TN322.8[电子电信—物理电子学] TQ153.2[化学工程—电化学工业]
作者机构:[1]State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China
相关基金:Project supported by the National Science and Technology Major Project, China (Grant No. 2011ZX02504-003), the Fundamental Research Funds for the Central Universities (Grant No. ZYGX2011J024), and the Open Foundation of State Key Laboratory of Electronic Thin Films and Integrated Devices, China (Grant No. KFJJ201301).