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A Water-free Low Temperature Process for Atomic Layer Deposition of Al2O3 Films
  • ISSN号：0948-1907
  • 期刊名称：Chemical Vapor Deposition
  • 时间：2013.6.6
  • 页码：156-160
  • 相关项目：碳基电路中的纳米尺度阻式存储稳定实现及物理机制
作者： Guo, Jiao-Jiao|Li, Ming-Da|Sun, Qing-Qing|Yang, Wen|Zhou, Peng|Ding, Shi-Jin|Zhang, David Wei|
同期刊论文项目
碳基电路中的纳米尺度阻式存储稳定实现及物理机制
期刊论文 18 会议论文 1
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