以典型抗生素类药物磺胺甲[口恶]唑(SMZ)为目标物,模拟太阳光下研究其在磷钨酸/二氧化钛(H3PW12O40/TiO2)复合膜上的光催化降解行为,并对其可能的降解机理进行探讨.通过一系列的条件实验确定H3PW12O40/TiO2复合膜光催化降解SMZ的最佳实验条件为:H3PW12O40/TiO2掺杂量为7.7%、污染物初始浓度为50mg·L^-1、溶液pH值为5.5.此时,H3PW12O40/TiO2复合膜表现出最强的光催化活性,其动力学常数为0.453h^-1,为纯TiO2膜的3.0倍;模拟太阳光照射12h后,复合膜对SMZ的矿化度可达66.6%,是纯TiO2膜的1.25倍.
Photocatalytic degradation of sulfamethoxazole (SMZ), a typical antibiotic, was performed using phosphotungstic acid/titanium dioxide (H3PW12O40/TiO2 ) composite film under simulated sunlight irradiation. The possible degradation mechanism was also discussed. Based on a series of experiments, the optimum conditions for SMZ degradation were determined as: H3PW12O40/TiO2 loading amount of 7.7%, initial SMZ concentration of 50 mg· L-1, and the solution pH of 5.5. Under this optimal condition, the kinetic constant of SMZ degradation using H3PW12O40/TiO2 was 0. 453 h-1, which was 3 times as large as that using pristine TiO2. After 12 h of illumination, SMZ mineralization was 66.6%, which was 1.25 times as large as that using TiO2.