位置：成果数据库 > 期刊 > 期刊详情页
A batch-based run-to-run process control scheme for semiconductor manufacturing
  • ISSN号：0740-817X
  • 期刊名称：IIE Transactions
  • 时间：2013.6.6
  • 页码：658-669
  • 相关项目：半导体制造中的高级统计过程控制算法研究
作者： Wang, Kaibo|Han, Kai|
同期刊论文项目
半导体制造中的高级统计过程控制算法研究
期刊论文 11
同项目期刊论文
A Mixed-Effect Model for Analyzing Experiments with Multistage Processes
A Variable-Selection-Based Multivariate EWMA Chart for Process Monitoring and Diagnosis
A run-to-run control algorithm based on timely and delayed mixed-resolution information
Coordination and control of batch-based multistage processes
A Hierarchical Model for Characterizing Spatial Wafer Variations
A Run-to-Run Profile Control Algorithm for Improving the Flatness of Nano-Scale Products
Process Adjustment with an Asymmetric Quality Loss Function
Optimal Setup Adjustment and Control Of A Process Under ARMA Disturbances
Monitoring the Covariance Matrix via Penalized Likelihood Estimation