中文摘要：

采用光辅助金属有机物化学气相沉积技术，在LaAIO，（100）单晶衬底上外延制备约500nm厚YBCO／ND·Y2O3／YBCO薄膜。用x射线衍射技术分析薄膜的物相结构和外延特性，通过扫描电子显微镜观察薄膜的表面与截面形貌。主要研究了不同生长时间的Y2O3纳米点对YBCO超导薄膜性能的影响。Y2O3纳米点生长时间为20s样品的临界电流密度达到2．4MA／cm^2（77K，0T），与未生长Y2O3纳米点的YBCO薄膜相比，其临界电流密度提高20％。分析表明，薄膜中的Y2O3在YBCO薄膜内部起到了有效钉扎中心作用，提高了临界电流密度。

英文摘要：

About 500 nm thick YBCO/ND-Y203/YBCO sandwich structure on LaAIO3 （100） substrate were grown successfully by photo-assisted MOCVD to investigate the possible improvement of self-field critical current density （Jo）. The phase structure and in-plane alignment was characterized by X-ray diffraction. The surface and cross-sectional morphology were evaluated by SEM. The effect of various growth time of ND-Y203 on the properties of YBCO thin films was investigated. Self-field critical current density determined by AC magnetic induction method shows that sample with 20 s growth ND-Y203 has the higher Jc of 2.4 MA/cm^2, which is 20% improved comparing with the samples without ND-Y203. The pinning effect caused by Y203 nanodots are considered to analyze the results about the Jc improvement and decline.