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Influences of periodic Si delta-doping on the characteristics of n-GaN grown on Si (111) substrate
ISSN号:0022-0248
期刊名称:Journal of Crystal Growth
时间:2014.2.1
页码:106-110
相关项目:常关型宽禁带氮化镓MOS场效应晶体管的研究
作者:
Lin Jiali|Wu Zhisheng|Liu Yang|Zhang Baijun|
同期刊论文项目
常关型宽禁带氮化镓MOS场效应晶体管的研究
期刊论文 31
专利 7
同项目期刊论文
Si衬底AlGaN/GaN功率开关场效应晶体管研制
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Vertical-conducting InGaN/GaN multiple quantum wells LEDs with AlN/GaN distributed Bragg reflectors
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Investigations of Leakage Current Properties in Semi-insulating GaN Grown on Si (111) Substrate with
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具有逆向导通能力的GaN功率开关器件
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Normally-off GaN recessed-gate MOSFET fabricated by selective area growth technique
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