中文摘要：

氮化碳因预言具有超金刚石硬度、高热稳定性及优异的摩擦磨损性能，在刀具涂层的应用领域具有巨大的潜力，引起了世界上科研工作者的广泛关注。本文以CF4＋N2＋H2＋Ar为反应气体，通过直流等离子体喷射法（DCPlasmaJetCVD），在si[100]基底上以金刚石薄膜为过渡层，成功制备了氮化碳涂层。利用扫描隧道显微镜（SEM）、原子力显微镜（AFM）、拉曼光谱（Raman）等现代理化测试手段，对所制备涂层的表面形貌、成分结构进行了表征和分析。研究结果表明：所制备的涂层中金刚石过渡层表面生长了线度约300—600nm的C3N4晶粒，为亚微米级别，晶形较为清晰，呈现不规整的柱状，样品中主要含有α-C3，N4与β—C3N4，涂层中N的含量为9．8％。

英文摘要：

Carbon nitride has been predicted to having the properties of super-diamond hardness, high thermal stabil- ity and low friction and wear coefficient, which has enormous potential in the field of tool coating application. It causes wide-spread concern of many scientists in the world. The coating was deposited on Si [ 100 ] substrate by direct current plasma jet CVD（DC PJ CVD） ,which used diamond film as buffer layer and used CF4, N2, H2 and Ar as reactant gases. The surface topography, structure and chemical bond formation were characterized by SEM, AFM, Raman and FFIR. The result showed that submicron crystalline carbon nitride（300 -60Ohm） based on the diamond film as buffer layer was pre- pared, and its crystal morphology was clear, and columnar-like. The sample mainly contains ot-C3N4 and β-C3N4 , and the nitrogen content in the film was 9.8%.