中文摘要：

将TiO2光催化剂固化在高压绝缘子表面形成无机防污闪薄膜,用XRD、UV-Vis、FT-IR和SEM表征和测试了薄膜的结构和光催化活性,比较了高压绝缘子涂覆光催化薄膜前后电气性能的变化和实挂的积污情况．结果表明,镀膜后的绝缘子电气性能变化不大,挂网6个月后样品表面的灰密值为镀膜前的1／35．在满足电气性能的前提下,镀膜后的绝缘子具有良好的光自洁能力和防污闪性能．

英文摘要：

TiO2 photocatalyst was coated and solidified on the insulator surface to form a film with anti-pollution-flashover function. The coating technology was explored, and XRD, UV-Vis, SEM and FT-IR were employed to characterize the film structure and test its photocatalytic activity. The electric property and the non-soluble deposit density （NSDD） on line were also tested, respectively. Comparing with the insulator without film, the electric property of the insulator with the film was not changed remarkably. The value of NSDD for the insulator with the film was 1/35 of that without film after six months hanging. The insulator with the film displays a good photocatalytic self-cleaning capability while satisfying the basic electric performance, and a function of anti-pollution-flashover.