中文摘要：

不同偏压下利用多弧离子镀技术在U基体上制备了TiN薄膜。利用X射线衍射（XRD）分析了薄膜的微观组织结构，用扫描电镜（SEM）观察其表面形貌。结果表明：所得薄膜为单一TiN结构，薄膜表面平整、致密，但局部仍存在大颗粒。摩擦磨损实验测定了薄膜的磨损性能。随偏压的上升，摩擦系数由0．421变为0．401。同时利用X射线光电子能谱分析仪（XPS）对湿热腐蚀20d后的样品进行了分析，并利用电化学极化实验在0．5μg/g CT溶液中测试了基体及薄膜耐蚀性能。结果表明：TiN涂层提高了贫铀的抗腐蚀性能。

英文摘要：

TiN thin films were prepared on uranium surface by using Arc ion plating at different bias voltages. Microstructure and topography were investigated by X-ray diffraction （XRD） and scanning electron microscope （SEM）. The result indicated that the film has a single TiN structure, a uniform and dense surface but with local large macro particles. Wear and friction tests were done. The friction coefficient varies from 0.421 to 0.401 with increasing of bias voltage. The specimens tested under the condition of humid and thermal corrosion for 20 days were analysed by XPS. Electrochemical polarization tests were conducted in aerated 50 μg/g Cf solution. Results of Electrochemical polarization scans and observations indicated that TiN coatings can improve the corrosion resistance of Uranium.