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深海静水压力环境下低合金高强度钢腐蚀行为研究
  • ISSN号:1006-3471
  • 期刊名称:《电化学》
  • 时间:0
  • 分类:TG161[金属学及工艺—热处理;金属学及工艺—金属学] TB383[一般工业技术—材料科学与工程]
  • 作者机构:[1]Surface Engineering Laboratory, Department of Materials Science and Engineering, Dalian University of Technology, Dalian 116023, China, [2]Institute of Metal Research, Chinese Academy of Sciences, Shenyang 110016, China
  • 相关基金:supported by the National Basic Research Program of China (No.2014CB643303); the National Natural Science Foundation of China (Nos.50801063 and 51271187)
中文摘要:

The adsorption and diffusion behavior of Cl~- on sputtering Fe-20 Cr nanocrystalline(NC) thin film compared with corresponding coarse crystalline(CC) alloy has been studied in HCl + NaCl solution(pH = 2,[Cl~-]=0.1 mol/L) by electrochemical techniques,X-ray photoelectron spectroscopy(XPS) and the firstprinciples calculations.The XPS results show that adsorption and diffusion of Cl~- in the passive film has been inhibited on NC thin film.Ultra-violet photoelectron spectroscopy(UPS) results show that the work function Φ_s of NC thin film(4.7 eV) is higher than that of CC alloy(4.5 eV).The theoretical calculations and valence electron structure analysis were used to understand the effect of nanocrystallization in this work.

英文摘要:

The adsorption and diffusion behavior of Cl~- on sputtering Fe-20 Cr nanocrystalline(NC) thin film compared with corresponding coarse crystalline(CC) alloy has been studied in HCl + NaCl solution(pH = 2,[Cl~-]=0.1 mol/L) by electrochemical techniques,X-ray photoelectron spectroscopy(XPS) and the firstprinciples calculations.The XPS results show that adsorption and diffusion of Cl~- in the passive film has been inhibited on NC thin film.Ultra-violet photoelectron spectroscopy(UPS) results show that the work function Φ s of NC thin film(4.7 eV) is higher than that of CC alloy(4.5 eV).The theoretical calculations and valence electron structure analysis were used to understand the effect of nanocrystallization in this work.

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期刊信息
  • 《电化学》
  • 北大核心期刊(2011版)
  • 主管单位:中国科学技术协会
  • 主办单位:中国化学会 厦门大学
  • 主编:孙世刚
  • 地址:厦门大学D信箱
  • 邮编:361005
  • 邮箱:dianhx@xmu.edu.cn
  • 电话:0592-2181469
  • 国际标准刊号:ISSN:1006-3471
  • 国内统一刊号:ISSN:35-1172/O6
  • 邮发代号:34-61
  • 获奖情况:
  • 国内外数据库收录:
  • 美国化学文摘(网络版),日本日本科学技术振兴机构数据库,中国中国科技核心期刊,中国北大核心期刊(2004版),中国北大核心期刊(2008版),中国北大核心期刊(2011版),中国北大核心期刊(2014版)
  • 被引量:4569