采用磁控溅射法在镍衬底上制备了不同性质的Fe:NiOx薄膜,通过改变反应压强,发现薄膜的催化活性随着压强的增大而提高.进一步利用EDX、XRD、XPS、SEM等分析发现,薄膜的有效表面积、结晶度以及样品中Ni3+的含量都对样品的催化活性有影响.另外对薄膜的透过特性也进行了研究,发现当膜厚超过1000nm后,对波长小于500 nm的可见光几乎全部吸收,表现出了很差的透光特性.
By changing the sputtering conditions, Fe:NiOx films with different catalytic behaviors were fabricated. With the increase of working pressure the overpotential in 100 mA·cm^-2 changed from 780 mV at 1.0 Pa to 330 mV at 4.0 Pa. At the same time the Tafel slop also decreased dramatically from 71 mV·dec^-1 to 53 mV·dec^-1. Then by further analysis of EDX, XRD, XPS, SEM, we found that the crystallinity and the effective reactive surface area, especially the content of Ni^3+, all can affect the catalytic properties. Lastly, we studied the transmittance of Fe:NiOx film in the range of visible light. But as the anode catalytic film, the transmittance of Fe:NiOx film is poor, especially with the increase of depth.