位置：成果数据库 > 期刊 > 期刊详情页
Structure and characteristics of amorphous (Ti,Si)-C:H films deposited by reactive magnetron sputter
  • ISSN号：0925-9635
  • 期刊名称：Diamond and Related Materials
  • 时间：0
  • 页码：1172-1177
  • 相关项目：复合结构碳基薄膜的制备及其摩擦学特性研究
作者： Jinlong Jiang|Junying Hao|Xianjue Pang|Peng Wang|Weimin Liu|
同期刊论文项目
复合结构碳基薄膜的制备及其摩擦学特性研究
期刊论文 6
同项目期刊论文
Influence of methane flow on the microstructure and properties of TiAl-doped a-C:H films deposited b
固体-油脂复合润滑II：类金刚石薄膜在几种空间用油脂润滑下的摩擦学性能
Structural, mechanical and tribological behavior of fullerene-like carbon film
Effects of bias voltage on structure and properties of TiAl-doped a-C:H films prepared by magnetron
Superlow friction of titanium/silicon codoped hydrogenated amorphous carbon film in the ambient air