中文摘要：

采用溶胶-凝胶法在Pt/Ti/SiO2/Si基片上制备了（Nd,Bi）4Ti3O12薄膜。将薄膜于空气中分别进行每1层、每2层、每3层500℃预退火10 min,最后于氮气氛中680℃退火30 min。结果表明：预退火工艺对薄膜的结构和铁电性能都有影响：每一层预退火处理的薄膜具有较大的剩余极化值和最小的矫顽场（2Pr=47.8μC/cm2,2Ec=254 kV/cm）。所有薄膜都呈现良好的抗疲劳特性。

英文摘要：

（Nd,Bi）4Ti3O12 thin films are deposited on Pt/Ti/SiO2/Si substrates in sol-gel process.The films are preannealed at 500 ℃ for 10 min every layer,every two layers and every three layers respectively,in the air,until all the films annealed at 500 ℃ for 30 min in nitrogen atmosphere.The results reveal that the structures and ferroelectric properties of（Nd,Bi）4Ti3O12 thin films sensitively depend on the preannealing treatment.The film,when preannealed every one layer in the air,has the larger remanent polarization value and the least coercive field（2Pr = 47.8 μC/cm2,2Ec= 254 kV/cm）.All the films exhibit fatigue-free characteristics.