中文摘要：

在掺铌钛酸锶（NST）的衬底上，通过加入抑制开裂剂聚乙二醇对异辛基苯基醚（triton X-100），利用溶胶-凝胶法制备了厚达4．6μm的锆钛酸铅镧（PLZT）薄膜，从而有效地减小了其在集成光学器件应用中的传输损耗。实验分析了triton X-100的加入量对薄膜质量的影响，并通过优化triton X-100的加入量可有效抑制薄膜开裂。利用光学显微镜、扫描电子显微镜（SEM）、X射线衍射仪（XRD）、棱镜耦合波导测试仪和台阶仪等对制备的薄膜性能进行分析。结果表明，经过650℃快速退火处理后，得到了表面平整度小于30nm、粒径为50～100mm的钙钛矿结构PLZT薄膜，测得PLZT（8／65／35）和PLZT（11／65／35）薄膜在1550nm波长处的折射率分别为2．4029和2．3885。本文方法制备的薄膜可以用于PLZT电光器件的制作。

英文摘要：

PLZT films have many significant applications in the field of integrated optics because of their desirable physical properties, such as dielectric properties, electric-optic effect and polarization insensitivity. A certain thickness of the electro-optic film is needed in the application of integrated optical devices. Currently,it is hard to obtain more than 3μm PLZT thin film, because the film is very easy to crack as the process is repeated for several times and the high temperature annealing treatment is taken during the fabrication of PLZT thin film by sol-gel methods. In this paper,a 4. 6μm thick PLZT thin film was fabricated on Nb-doped strontium titanate （NST） substrate using sol-gel methods by adding triton X-100 as the stress crack inhibitor in order to reduce the propagation loss in the applications of integrated optical devices effectively. The effect of the added amount of triton X-100 on the film property is studied experimentally. And the film cracking can be eliminated effectively by optimizing the triton X-100 amount. Meanwhile, the obtained film is characterized by optical microscope, scanning electron microscopy （SEM） ,X-ray diffraction （XRD）,prism coupler and step profiler. The results show that the perovskite PLZT film is obtained after rapid thermal annealing at 650 ~C for 30 rain,and the flatness of the film surface is less than 30 nm with the average particle size of 50-100 nm. The measured refractive indices of the PLZT （8/65/35） and the PLZT （11/65/35） films are 2. 4029 and 2. 388 5,respectively at the wavelength of 1550 nm. They can both be used for PLZT electro-optical device fabrication.