中文摘要：

采用磁控溅射法制备Ti-O薄膜，然后采用等离子体浸没离子注入设备，以氢气作为离子注入源，轰击至钛氧薄膜表面，使其产生羟基基团。并对注入后样品进行酸活化，以期得到更多的羟基。采用傅立叶红外光谱仪（FTIR）、X射线衍射（XRD）、X射线光电子能谱仪（XPS）、扫描电子显微镜（SEM）等对材料表面的结构、成份、官能团变化进行表征。研究结果显示，Ti-O薄膜经H^＋注入后再进行活化，磁控溅射Ti-O薄膜得到明显增多的羟基。

英文摘要：

In this paper, the TiO2 films were prepared by unbalanced magnetron sputtering deposition system. To obtain hydroxyl group, the films were treated by plasma immersion H^＋ ion implantation. The films were then activated by acid solution. The surface characteristics of samples were investigated by fourier transfer infrared spectrum （FTIR）, X-ray diffraction （XRD）, X-ray photoelectron spectroscopy （XPS）, and scan electronic microscope （SEM）. The results showed that the implanted films were easier to obtain hydroxyl group after activated by acid solution.