中文摘要：

为探讨He-Ne激光对紫外线-B（UV-B）辐射损伤修复途径,采用He-Ne激光辐照（5mW·mm-2）进行照射,对增强UV-B（13.08kJ·m-2·d-1）辐射下水稻幼苗的叶绿素含量、核酮糖-1,5-二磷酸羧化酶/加氧酶（rubisco）亚基含量及反映植物光系统II（PSII）的荧光参数值进行测定。结果表明,经UV-B处理后,水稻叶片中的叶绿素含量、rubisco亚基含量及荧光参数值（除qN以外）低于对照组（CK）,差异显著（P〈0.05）,其中荧光参数Fv/Fm对环境胁迫反映最为敏感;而单独He-Ne激光（L）处理组均高于对照组（CK）,差异不显著（P〉0.05）;经He-Ne激光和UV-B复合组（BL）均高于UV-B处理组,低于对照组,差异显著（P〈0.05）;说明UV-B辐射对水稻幼苗的光合系统有损伤作用,而一定剂量的He-Ne激光可以提高水稻的光合能力,表明He-Ne激光对增强UV-B辐射造成的损伤具有一定修复作用。

英文摘要：

In order to investigate the influence of photosynthesis on rice flag under enhanced UV-B radiation and He- Ne laser. He-Ne laser （5 mW · mm^- 2） irradiation and enhanced UV-B （13.08 kJ · m^-2 · d^-1） radiation were used, the chlorophyll content and Rubisco of rice seedling leaves, chlorophyll fluorescence parameters about plant photosystem II （PSII） are measured. The results show that, after UV-B treatment, the chlorophyll content in rice leaves, and fluorescence parameters （other than qN） is lower than the control group （CK） and has significant differences （P〈0.05）. The fluorescence parameter photochemical quantum yield （Fv/Fm） is the most sensitive to environmental stress reflection. In indicator group treated by He-Ne laser （L）, the chlorophyll content and Rubisco in rice leaves are higher than the control group （CK） （P 〉 0. 05）, fluorescence parameters does not change significantly （P〉0.05）. Compared with the control group （P〈0.05）, groups treated with He-Ne laser and UV-B, chlorophyll content, rubisco, and fluorescence parameters （except for qN ） of the rice leaves are higher than UV-B treated group. UV-B radiation on rice seedlings has injury to PSII, and a certain dose of He-Ne laser can improve the photosynthetic efficiency of rice. He-Ne laser can repair damage of enhanced UV-B to rice.