中文摘要：

用原子力显微镜观察经不同退火温度处理TiO2薄膜的表面形貌,观察结果表明,随着退火温度的升高,颗粒不断长大,数目逐渐减少,表面粗糙度RMS从4.1nm增大到18.4nm。用最小二乘法对原子力显微镜图像多重分形谱进行二次函数拟合,结果显示,随着退火温度的升高,α0从1.999增大到2.008,B由正值转变为负值,分形谱宽W由0.064增大到0.246,说明TiO2薄膜表面形貌愈来愈复杂。

英文摘要：

Surface topographies of TiO2 thin films prepared by radio frequency magnetron sputtering technique for different annealed temperature are characterized by atomic force microscope. It indicates that as the annealed temperature increases, grain size of the film increases, the number of grains decrease and RMS roughness value of the films increases from 4. 1-18.4nm. Multi-fractal spectrum of atomic force microscope images was fitted to quadratic function by means of least square procedure. As the annealed temperature increases, α0 increases from 1. 999-2. 008, B value changes from positive to negative, the width of the spectrum W increases from 0. 064 to 0.246. The results show that the surface topography of TiO2 thin films become more complex.