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High performance VO2 thin films growth by DC magnetron sputtering at low temperature for smart energ
ISSN号:0925-8388
期刊名称:Journal of Alloys and Compounds
时间:2015.11.12
页码:198-202
相关项目:三倍频强激光薄膜元件的离子后处理机理研究
作者:
Dong-ping Zhang *, Mao-dong Zhu, Yi Liu, Kai Yang,Guang-xing|
同期刊论文项目
三倍频强激光薄膜元件的离子后处理机理研究
期刊论文 15
会议论文 1
同项目期刊论文
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氧分压对磁控溅射VO_2薄膜相变性能的影响