中文摘要：

采用溶胶-凝胶（sol-gel）自旋涂敷法在硅基氧化铝纳米有序孔膜版介质上（膜版孔径尺寸20～100nm,内生长金属纳米线作为底电极一部分）制备Pb（Zr0.53Ti0.47）O3（PZT）纳米结构铁电膜,并对其介电、铁电性能及微结构进行了表征。介电测量结果表明,厚度25nm的PZT铁电膜,其介电常数在低频区域（频率〈10^4Hz）从860迅速下降到100,然后保持在100左右,直至测量频率升高到10^6Hz。低频区域的介电常数迅速下降是由空间电荷极化所致,它与薄膜和电极之间聚集的界面空间电荷密切相关,尤其是在薄膜与Au纳米线的弯曲界面处。介电损耗在4000Hz附近出现峰值,它来源于空间电荷的共振吸收效应。电滞回线测量结果表明,厚度为100nm的PZT铁电膜,其剩余极化强度为50μC/cm^2,矫顽场强为500kV/cm。剖面透射电镜（TEM）像表明PZT纳米铁电膜与底电极（金属纳米线）直接相接触,它们之间的界面呈现一定程度的弯曲。在PZT纳米铁电薄膜后退火处理后,发现部分Au金属纳米线顶端出现分枝展宽现象;而改用Pt纳米线后可有效抑制这种现象。为兼顾氧化铝纳米有序孔膜版内的金属纳米线有序分布及PZT纳米膜的结晶度,选择合适的退火温度是制备工艺中的关键因素。

英文摘要：

By using sol-gel spin coating method nanostructured Pb（Zr0.53Ti0.47）O3（PZT） ferroelectric thin films were fabricated on the Si substrates coated by nanoporous alumina membranes with average pore sizes of 20-100nm,in which metal（Au or Pt）nanowires were embedded as a part of the bottom electrode.The dielectric,ferroelectric properties and microstructure of the nanostructured PZT thin films were characterized.The dielectric measurements demonstrated that the dielectric constant of the PZT nanofilms with a thickness of 25nm decreased quickly from 860 to 100 as increasing the frequency below 104 Hz,and then remained almost constant of 100 as further increasing the frequency up to 106 Hz.Such a fast decrease of the dielectric constant in the low frequency region was resulted from the dielectric relaxation of space charges accumulated at the interfaces between the nanofilm and the（bottom and top）metal electrodes.The dielectric loss peak observed near 4000Hz was contributed from the resonant absorption effect of the space charges.The polarization-electric field hystere-sis loops of the nanostructured PZT films with a thickness 100nm showed that the remanent polarization of the PZT nanofilm was 50μC/cm2 and coercive field of 500kV/cm.Cross-sectional TEM images showed that the nanostructured PZT films contacted directly with the bottom electrode（metal nanowires）,and the interface between them exhibited some degree of waviness.It was found that some Au nanowires became into branches at their ends after post-annealing the PZT nanofilms,whereas such a phenomenon was effectively prohibited by using Pt nanowires.A selection of proper post-annealing temperature was the critical processing parameter for fabricating nanostructured PZT ferroelectric thin films as making a trade-off between the ordered metal nanowires within the nanoporous alumina membranes and the crystallinity of ferroelectric nanofilms.