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Structural Evolution of SiC Films During Plasma-Assisted Chemical Vapour Deposition
  • 期刊名称：Plasma Science and Technology
  • 时间：0
  • 页码：159-162
  • 语言：英文
  • 相关项目：低气压多频等离子体与材料表面相互作用
作者： ZHU Xiaodong|ZHOU Haiyang|DING Siye|YAN Guanchao|
同期刊论文项目
低气压多频等离子体与材料表面相互作用
期刊论文 80 会议论文 8
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