以氟碳铈矿焙砂盐酸二步浸取的氯化铈溶液为原料,用碳酸氢铵作沉淀剂。沉淀经过滤、洗涤、烘干、焙烧及研磨制得用于抛光的CeO2。讨论了加料方式、氯化铈浓度、分散剂用量及焙烧温度对CeO2粒径大小及分布的影响。结果表明在含15g/L聚乙二醇1000的饱和碳酸氢铵溶液中滴加0.2mol/L氯化铈,500℃下焙烧,得到平均粒径为1.15μm,粒径分布窄的CeO2粉体。利用X衍射测定CeO2晶体结构,证明所得到的CeO2属于立方晶系,其空间点群为O^5H-FM3M。
The CeO2 powder employed in polishing glass was prepared by the following processing: precipitating, rinsing, drying, roasting and milling, in which the CeCl3 solution was prepared by two steps leaching from bastnasite and NH4HCO3 was used as precipitator. The effects of relevant factors such as precipitation method, concentration of CeCl3, disperser dosage and calcination temperature on particle size and distribution were investigated respectively. The optimal condition was obtained as the following: the 0.2mol/L cerium chloride acting as titration agent, saturated water with NH4HCO3 including 15g/L PEG, masting at 500℃ for 2 hours. The average particle size is 1.15μm. It is proved that CeO2 is cubic in structure with space group of O5H - FM3M by XRD.