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常压低温等离子体对酵母菌的失活作用
  • ISSN号:0367-6234
  • 期刊名称:《哈尔滨工业大学学报》
  • 时间:0
  • 分类:O539[理学—等离子体物理;理学—物理]
  • 作者机构:[1]渤海大学物理系,辽宁锦州121013, [2]大连理工大学物理系,大连116023
  • 相关基金:国家自然科学基金资助项目(10275010)
中文摘要:

对氦气介质阻挡放电等离子体和氦气毛细管介质阻挡放电冷等离子体射流失活酵母菌的效率和机制进行了比较研究.分析比较了两种等离子体处理的菌液存活曲线和pH值的变化情况;利用扫描电子显微镜观察了菌体表面超微结构的变化.结果显示两种等离子体对酵母菌均有较强的杀灭作用,介质阻挡放电等离子体处理5 m in后可使其减少约7个数量级,而毛细管介质阻挡放电冷等离子体射流处理后可使其减少约8个数量级;同时经过两种等离子体处理后的pH值均明显下降,且毛细管介质阻挡放电冷等离子体射流处理菌液的pH下降幅度大于介质阻挡放电等离子体处理的菌液;从扫描电子显微镜的照片可以看到两种等离子体处理后的菌体均已破裂.实验结果表明毛细管介质阻挡放电冷等离子体射流失活酵母菌的效率要高于介质阻挡放电等离子体,并且杀菌机理应该与细胞破裂及pH值的变化有关.

英文摘要:

The sterilizing effect and the inactivation mechanisms of low temperature atmospheric pressure helium plasma generated by dielectric barrier discharge and atmospheric cold plasma jet generated by capillary atmospheric dielectric barrier discharge on baker' s yeast were analyzed and compared. The relationship of survival number versus plasma treatment time and that of yeast pH value versus plasma treatment time using different plasmas were studied. The morphology of the yeast was observed by scanning electron microscopy. Resuits demonstrate that two kinds of plasma have strong sterilization effect on the yeast. At least a 7 log 10reduction in the survival number after being treated with plasma generated by dielectric barrier discharge and at least a 8 log 10reduction in the survival number after being treated with cold plasma jet generated by capillary atmospheric dielectric barrier discharge are realized. Simultaneously, pH value has remarkable change after two kinds of plasma treatment and it is more remarkably changed for atmospheric cold plasma jet generated by capillary atmospheric dielectric barrier discharge. The yeast treated with two kinds of plasma ruptures completely. It is demonstrated that the sterilizing effect of cold plasma jet generated by capillary atmospheric dielectric barrier discharge is stronger than that generated by dielectric barrier discharge. The inactivation mechanisms are concerned with the rupture of the yeast and the pH value change.

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期刊信息
  • 《哈尔滨工业大学学报》
  • 中国科技核心期刊
  • 主管单位:中华人民共和国工业和信息化部
  • 主办单位:哈尔滨工业大学
  • 主编:冷劲松
  • 地址:哈尔滨市南岗区西大直街92号
  • 邮编:150001
  • 邮箱:
  • 电话:0451-86403427 86414135
  • 国际标准刊号:ISSN:0367-6234
  • 国内统一刊号:ISSN:23-1235/T
  • 邮发代号:14-67
  • 获奖情况:
  • 2000年获黑龙省科技期刊评比一等奖,中国期刊方阵“双效”期刊
  • 国内外数据库收录:
  • 美国化学文摘(网络版),美国数学评论(网络版),德国数学文摘,荷兰文摘与引文数据库,美国工程索引,美国剑桥科学文摘,日本日本科学技术振兴机构数据库,中国中国科技核心期刊,中国北大核心期刊(2004版),中国北大核心期刊(2008版),中国北大核心期刊(2011版),中国北大核心期刊(2014版),中国北大核心期刊(2000版)
  • 被引量:27329