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Effects of Low-Frequency Source on a Dual-Frequency Capacitive Sheath near a Concave Electrode

ISSN号：1009-0630
期刊名称：《等离子体科学与技术：英文版》
时间：0
分类：O536[理学—等离子体物理;理学—物理] TP273[自动化与计算机技术—控制科学与工程;自动化与计算机技术—检测技术与自动化装置]
作者机构：[1]Department of Physics and Electronic Engineering, Handan College, Handan 056005, China, [2]School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116023, China
相关基金：supported by Handan Science and Technology Research and Development Project of China （No. 1121120069-5） and the Scientific Research Start-up Funds of Doctor and Master of Handan College of China （No. 2010005）, National Natural Science Foundation of China （Nos. 11335004 and 11375040）, the Important National Science and Technology Specific Project of China （No. 2011ZX02403-001）

关键词：极低频, 双频率, 离子能量分布, 电极, 容性, 径向电场, 电容式套管, 模型开发, capacitively coupled plasma, sheath, fluid, two dimension, LF power

中文摘要：

A self-consistent two-dimensional(2D) collisionless fluid model is developed to simulate the effects of the low-frequency(LF) power on a dual frequency(DF) capacitive sheath over an electrode with a cylindrical hole.In this paper,the time-averaged potential,electric field(Efield),ion density in the sheath,and ion energy distributions(IEDs) at the center of the cylindrical hole’s bottom are calculated and compared for different LF powers.The results show that the LF power is crucial for determining the sheath structure.As the LF power decreases,the potential drop decreases,the sheath becomes thinner,and the plasma molding effect seems to be more significant.The existence of a radial E-field near the sidewalls of a hole may cause a significant portion of ions to strike the sidewall and lead to the phenomenon of notching.

英文摘要：

A self-consistent two-dimensional （2D） collisionless fluid model is developed to sim- ulate the effects of the low-frequency （LF） power on a dual frequency （DF） capacitive sheath over an electrode with a cylindrical hole. In this paper, the time-averaged potential, electric field （E- field）, ion density in the sheath, and ion energy distributions （IEDs） at the center of the cylindrical hole＇s bottom are calculated and compared for different LF powers. The results show that the LF power is crucial for determining the sheath structure. As the LF power decreases, the potential drop decreases, the sheath becomes thinner, and the plasma molding effect seems to be more significant. The existence of a radial E-field near the sidewalls of a hole may cause a significant portion of ions to strike the sidewall and lead to the phenomenon of notching.

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