中文摘要：

脉冲电子束辐照材料试验研究中，束流电子具有不同的速度和角度分布。但数值模拟计算一般都考虑电子束垂直入射靶材料，这可能导致数值计算结果与试验结果不符。针对该问题，提出了一种计算电子束辐照下能量沉积剖面的新方案，利用MCNP （Monte Carlo N Particle Transport Code）软件对铝、铜、钽金属材料在电子束辐照下的能量沉积进行模拟，分析了电子束垂直入射与带有角度分布入射时能量沉积的差异，为解释电子束辐照试验测量数据与理论计算结果之间的差异提供了依据。

英文摘要：

Background： In an electron beam experiment, electrons accelerated in electromagnetic field have different kinds of velocities and angles. However, in early numerical simulation calculations, the electron beam is always supposed to perpendicularly hit the surface of target materials, which will cause biases between simulations and experiments. Purpose： In this paper, a new method has been given to calculate energy deposition profile of intense pulsed electron beam which may explain the biases. Methods： MCNP （Monte Carlo N Particle Transport Code） is used to study metals such as aluminum, cuprum and tantalum. The differences between electron beam perpendicular to material and the one with angle distribution were worked out. Results： The results show that the energy deposition peak of pulsed electron beam with angular distribution is smaller than that of electron beam which is perpendicular. Conclusion： This may explain the biases between simulations and experiments.