位置：成果数据库 > 期刊 > 期刊详情页
强磁场和后退火处理对热蒸发Ni/Si(100)薄膜的影响
  • ISSN号：1546-2218
  • 期刊名称：Computers Materials & Continua
  • 时间：2013
  • 页码：117-129
  • 相关项目：强磁场下纳米颗粒的结构演化及其对薄膜生长的影响
作者： 李国建|
同期刊论文项目
强磁场下纳米颗粒的结构演化及其对薄膜生长的影响
期刊论文 26 专利 1
同项目期刊论文
强磁场对分子束气相沉积Fe60Ni40薄膜微观结构和磁性能的影响
Tunable phase formation in Ni-Fe thin films at nanoscale using high magnetic fields
强磁场对不同厚度Fe80Ni20薄膜的微观结构及磁性能的影响
强磁场作用时间对氧化法制备的Co掺杂ZnO薄膜微观结构和光学性能的影响
Controllable irregular phenomenon induced by Ag atomic segregation on the melting of (AgPd)561 bimet
Improving magnetic properties of molecular-beam-vapor-deposited Ni45Fe55 nanocrystalline films by in
Effects of high magnetic field on the microstructure and magnetic properties of Fe80Ni20 thin films
Size and composition dependence of the frozen structures in Co-based bimetallic clusters
The Effect of Static Magnetic Field on Electroless Ni-P In Situ Deposition and Post-annealing
Formation of icosahedral and HCP structures in bimetallic Co–Cu clusters during the freezing process
强磁场对不同厚度Fe-Ni纳米多晶薄膜的生长过程及磁性能的影响