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一种新型酞菁类光蚀刻记录材料的光生酸性质研究
  • 期刊名称：感光科学与光化学.2007, 25(2):142-146
  • 时间：0
  • 分类：TQ57[化学工程—精细化工]
  • 作者机构：[1]清华大学化学系有机光电子与分子工程教育部重点实验室,北京100084
  • 相关基金：国家自然科学基金（20333080,20572059,20502013）;国家基础研究项目（2007CB808000）.
  • 相关项目：ZSM-5以及L-型沸石受限空间控制的烯烃的“ene“反应
关键词： 化学增幅抗蚀剂, 光生酸剂, 光催化, 酞菁, chemical amplification, photoacid generator, photo-catalysis, phthalocyanine
中文摘要：

通过研究对甲苯磺酸酯空心酞菁的性质，发现该化合物在紫外光照射下可生酸，是一种光生酸剂．由于酞菁类化合物本身具有光催化氧化反应的性能，因此这类光生酸剂在光蚀刻技术中将有很好的应用潜能．

英文摘要：

A New Phthalocyanine derivative, the p-toluenesulfonylphthalocyanine was synthesized from metal-free phthalocyanine. The photolysis properties of the compound exposed with UV light was investigated. It was found that the p-toluenesulfonylphthalocyanine can generate acid after exposure. With good photocatalysis property, this photoacid-generator is applicable to chemically amplified photoresist.

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