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Effects of electric field annealing on the interface diffusion of Cu/Ta/Si stacks
  • ISSN号：0169-4332
  • 期刊名称：Applied Surface Science
  • 时间：2011.10.10
  • 页码：10845-10849
  • 相关项目：多面体晶粒构建金属纳米线的调控制备、生长机理及性能研究
作者： Wang Lei|Cao Zhenhua|Lan Chen|Qianwei She|Meng Xiangkang|
同期刊论文项目
多面体晶粒构建金属纳米线的调控制备、生长机理及性能研究
期刊论文 28 获奖 10
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