中文摘要：

采用多弧离子镀技术在65Mn钢表面制备了不同调制周期的Cr/CrN纳米多层膜。采用俄歇能谱仪（AES）、扫描电子显微镜（SEM）、X射线衍射仪（XRD）、纳米硬度仪、轮廓仪和划痕仪,分析了不同调制周期Cr/CrN纳米多层膜的成分分布、微观结构、力学性能、残余应力和结合强度。结果表明,Cr/CrN纳米多层膜的表面平整致密,截面层状调制结构清晰,其调制结构为Cr层-过渡层-CrN层的＂三明治＂结构,调制比约为1∶1。多层膜由CrN、Cr2N和Cr相组成,在CrN（200）方向上出现择优取向。当调制周期为80 nm时,多层膜的硬度值相对较高。随调制周期的增大,Cr/CrN多层膜的残余应力值减小,结合强度值先增大后减小。当调制周期为120 nm时,涂层的划痕临界载荷值相对较高,为69 N。

英文摘要：

Cr/CrN multilayer films with different modulation period were deposited on 65Mn steel substrate by using multi-ion plating technologies.The composition distribution,microstructure,mechanical property,residual stress and adhesion strength of Cr/CrN multilayer films with different modulation period were tested by Auger electron spectrometer,scanning electronic microscopy,X-ray diffraction,nano hardness tester,profile instrument and scratch instrument,respectively.The results show that the surface of Cr/CrN multilayer films is low in roughness and appears distinct modulate structure in sectional morphology.The microstructure for Cr/CrN multilayer is typical sandwich structure with Cr layer-transition layer-CrN coatings.And the modulate ratio for two modulate layer was about 1∶1.And Cr/CrN multilayer is consisted of CrN、Cr2N and Cr phase.The preferential growth orientation of the film is at CrN（200）.With reducing modulation period,the hardness and residual stress of Cr/CrN multilayer increase.When the modulation period is 80 nm,the hardness of Cr/CrN multilayer reaches the maximum.The H3∶E2 and critical load value reaches the maximum when the modulation period is 120 nm.