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Low-temperature engineering for high-quality epitaxy of ZnO film on Si(111) substrate
  • ISSN号：0003-6951
  • 期刊名称：Applied Physics Letters
  • 时间：0
  • 页码：151912-151914
  • 语言：英文
  • 相关项目：高质量氧化锌单晶薄膜的界面工程和能带工程及其光电子器件应用
作者： X. N. Wang|Z. F. Li|Z. X. Mei|W. Lu|H. T. Yuan|X. N. Zhang|J. Dong|X. L. Du|Y. Wang|T. C. Zhang|Z. Q. Zeng|Z. Zhang|Q. K. Xue|J. F. Jia|
同期刊论文项目
高质量氧化锌单晶薄膜的界面工程和能带工程及其光电子器件应用
期刊论文 60 会议论文 32 专利 25
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