中文摘要：

采用射频磁控溅射法在Al2O3（001）衬底上制备了高Mg含量的MgxZn（1-x）O薄膜,研究了MgxZn（1-x）O薄膜的结构和光学性能。结果表明：Al2O3（001）衬底上MgxZn（1-x）O薄膜的组分为Mg（0.47）Zn（0.53）O,薄膜呈六方纤锌矿结构,薄膜沿c轴方向取向生长,且c轴方向晶格增大0.0029 nm。薄膜的吸收边峰值位于292nm,对应的禁带宽度为4.24ev。薄膜平均粒径约为10～20nm,在深紫外-可见光激发下的荧光发射峰分别位于320nm和400nm附近。

英文摘要：

MgxZn（1-x）O film with high Mg content was prepared on Al2O3（001） substrate by radio-frequency magnetron sputtering method.Micro-structure and optical properties of the MgxZn（1-x）O film were studied.The results show that the composition of the film deposited on Al2O3（001） substrate is Mg（0.47）Zn（0.53）O with hexagonal wurtzite structure.The growth orientation of the film is along c axis.The crystal lattic length in c direction increases 0.0029 nm compared with that of ZnO.The absorption edge peak of the film is at 292 nm and the corresponding band gap is 4.24 eV.The average diameter of the grains is about 10-20 nm.The fluorescent emission peaks are located at 320 and 400 nm under deep-ultraviolet light excitation respectively.