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中文摘要：
设计了一种利用介质阻挡放电产生等离子体对材料表面进行处理的新型表面处理装置．此装置采用交流高压驱动，在每个电压半周期内放电次数达到4次甚至更多次，能够产生大量的等离子体．此装置产生的等离子体距离待处理材料近，对等离子体具有较高的利用率，在工业应用方面具有较高的应用前景．
英文摘要：
A new-type of device that use dielectric barrier diasharge to generate plasma for surface treatment is designed.It is driven by an ac alternating （urrent） power supply,and a large number of plasma is produced due to four or even more times diasharge per half cycle of the driven voltage.ln addition,the de- vice generats plasma at the place that is close to the materials which need to be processed and has a high use ratio of plasma, thus showing great promise in industrial application.
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