用脉冲直流等离子体辅助化学气相沉积(PCVD)方法在高速钢基体上沉积出Ti-Si-C-N超硬薄膜.XRD,XPS及HRTEM等测试表明,薄膜由纳米晶/非晶复合结构组成(nc-Ti(C,N)/a-Si3N4/a-C-C或nc-Ti(C,N)/h-Si3N4/a-Si3N4/a-C-C).Ti(C1N)显示(200)晶面择优取向.高温氧化实验显示:随Ti含量降低和Si含量增大,Ti-Si-C-N薄膜的抗氧化温度逐步提高;当Ti含量为8.7%、Si含量为17.8%时,薄膜中出现少量晶化的密排六方结构的h-Si3N4,弥散分布在非晶基体中,薄膜抗氧化温度达到900℃.Ti-Si-C-N薄膜的氧化过程分为增重和失重两个阶段,进入失重阶段后薄膜很快失效.
Superhard nanocomposite Ti-Si-C-N coatings were deposited on substrate of high speed steel using an industrial pulsed d.c. plasma chemical vapor deposition (PCVD) set-up. Detailed microstructure examined by means of XRD, XPS and TEM suggested that the Ti-Si-C-N coatings were the nanocomposite structure composed of nanocrystalline Ti(C, N) and amorphous carbon and Si3N4, occasionally h-Si3N4. Ti(C, N) showed a strong (200) preferred orientation. With increasing of Ti content and decreasing of Si content, high-temperature oxidation resistance was improved gradually. When Ti and Si contents were 8.7% and 17.8%, respectively, the coating exhibited the better high temperature (900 ℃) oxidation resistance, which is related to the increase of amorphous Si3N4 and h-Si3N4 appeared dispersively in the amorphous matrix, both can act as an efficient barrier against oxygen diffusion. Two-stage oxidation process involving mass gain and loss were observed, the failure of the coating took place in the process of mass loss.