中文摘要：

文章考察了自行合成的含磷聚酰亚胺（PI）薄膜在模拟原子氧环境中的降解行为。扫描电子显微镜（SEM）、X射线光电子能谱（XPS）等测试结果表明：在原子氧辐照过程中,含磷PI薄膜表面的磷元素与氧元素含量增加,原子结合能也增大,意味着在PI表面形成了含磷钝化层。该钝化层进一步阻止了PI次表面层被侵蚀,使含磷PI薄膜表现出了抗原子氧侵蚀能力,其在模拟原子氧环境中的质量损失率远低于Kapton薄膜。

英文摘要：

The degradation of phosphorus-containing polyimide（PI） films in the simulated atom oxygen environment is investigated using the samples developed in our laboratory.The test results from scanning electron microscope（SEM） and X-ray photoelectron spectroscopy（XPS） indicate that the phosphorous and oxygen element contents in the PI film surfaces are increased significantly after the atomic oxygen irradiation;meanwhile,the binding energies are increased at the same time,which suggests that a surface layer of phosphorus oxide is formed to inhibit the further erosion of the underlined PI film surface.Thus,the present PI films exhibit a good atomic oxygen resistance,whose mass loss rates are much lower than that of the Kapton film.