中文摘要：

使用原子力显微镜（AFM）观测了吸附在二氧化硅基片表面的硅烷偶联剂薄膜的形貌．结果表明,在气相法吸附过程中偶联剂是以分子形态吸附在基片表面,而在液相法吸附过程中偶联剂是以分子聚合体的形态吸附在基片表面,因此通过气相法吸附在基片表面的吸附膜比通过液相法吸附在基片表面的吸附膜光滑．硅烷偶联剂在二氧化硅基片表面有化学吸附和物理吸附两种模式,吸附了硅烷偶联剂薄膜的基片表面呈现出一定的疏水性．

英文摘要：

The surface topography of the deposited films of silane coupling agent （KH-550） formed on quartz substrate （0001） was investigated using atomic force microscopy （AFM）. Because of the KH- 550 adsorbed on the substrate by the formation of molecule during vapor phase deposition but adsorbed on the substrate by the formation of granular aggregates from solution deposition, the film formed via vapor phase deposition is smoother than the film adsorbed from solution deposition. The character and the topography of the KH-550 film adsorbed on the quartz substrate were investigated before and after toluene rinsing, the results show that the silane coupling agent adsorbed on the substrate by physisorption and chemisorption, the KH-550 films present some hydrophobic character.