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Study on the energy structure of amorphous antireflection Er(2)O(3) films on Si(001) substrates
期刊名称:OPTOELECTRONIC MATERIALS
时间:0
页码:612-615
语言:英文
相关项目:非晶稀土氧化物高k栅介质材料的制备及物理特性研究
作者:
Zhu, Yan-Yan|Ji, Ting|Liu, Yong-Sheng|Fang, Ze-Bo|
同期刊论文项目
非晶稀土氧化物高k栅介质材料的制备及物理特性研究
期刊论文 26
专利 1
同项目期刊论文
Band offsets of epitaxial Tm2O3 high-k dielectric films on Si substrates by X-ray photoelectron spec
Temperature effects on the growth and electrical properties of Er2O3 ?lms on Ge substrates
Tm2O3 相对于Si的能带偏移研究
Composition dependence of interface control and optimization on the performance of an HfTiON gate di
Optical constants of Er(2)O(3)-Al(2)O(3) films studied by spectroscopic ellipsometry
Er2O3栅介质积累端电容频率色散效应的研究
Optical constants of Al-doped Er(2)O(3) films prepared by radio frequency reactive magnetron sputter
Structural and optical properties of Er(2)O(3) films
Amorphous Er(2)O(3) films for antireflection coatings
Band gap and structure characterization of Tm2O3 films
Annealing effects on the structure and electrical characteristics of amorphous Er(2)O(3) films
Study on vacuum ultraviolet spectra of amorphous Er(2)O(3) films on Si(001) substrates
基于随机配置法和输入端缩减技术的统计静态时序分析
Tm_2O_3相对于Si的能带偏移研究
La基高k栅介质的研究进展