中文摘要：

The preparation of SmOx/Rh(100) and CO adsorption on this model surface have been investigated with Auger electron spectroscopy (AES), X-ray photoelectron spectroscopy (XPS) and temperature programmed desorption spectroscopy (TDS). The oxygen adsorption on the SmRh alloy surface leads to the aggregation of Sm on the surface. The thermal treatment of this oxidized surface induces the further agglomeration of SmOx on the Rh(100) surface. Compared with CO TDS on the clean Rh(100) surface, three additional CO desorption peaks can be observed at 176,331 and 600 K on the SmOx/Rh(100) surface. The CO desorption peak at 176 K may originate from CO adsorbed on SmOx islands, while the appearance of the CO adsorption peaks at 331 and 600 K, depending on the oxidation state of Sm, is attributed to CO species located at the interface of SmOx/Rh(100).

英文摘要：

The preparation of SmOx/Rh(100) and CO adsorption on this model surface have been investigated with Auger electron spectroscopy (AES), X-ray photoelectron spectroscopy (XPS) and temperature programmed desorption spectroscopy (TDS). The oxygen adsorption on the SmRh alloy surface leads to the aggregation of Sm on the surface. The thermal treatment of this oxidized surface induces the further agglomeration of SmOx on the Rh(100) surface. Compared with CO TDS on the clean Rh(100) surface, three additional CO desorption peaks can be observed at 176, 331 and 600 K on the SmOx/Rh(100) surface. The CO desorption peak at 176 K may originate from CO adsorbed on SmOx islands, while the appearance of the CO adsorption peaks at 331 and 600 K, depending on the oxidation state of Sm, is attributed to CO species located at the interface of SmOx/Rh(100).