设计实现了一个基于SEMI标际准的半导体工艺设备仿真平台,该平台具有通用可配置特性。在该平台的基础上,构建了一套基于SEMIS,准的气路功能仿真系统,该气路仿真系统包含了功能层、逻辑层和外部通信接口层,既能满足单独设备的功能仿真需求,也能对整个系统的功能进行仿真验证.该系统实现了对物理气相沉积(PVD)系统中,气路中阀门的闭合动作及气流变化等的实时仿真分析.
A general and configurable simulation platform based on SEMI standard is designed. On this general platform, a gas pressure subsystem simulation platform is implemented, which has the function layer, logic layer and communication interface layer. This system can meet the needs of both a single device and a whole system. Results show that the operation of the valve and the change of the gas flow in physical vapor deposition (PVD) system can be simulated in real time.