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Design space of electrostatic chuck in etching chamber
  • 期刊名称:SEMICONDUCTOR DEVICES
  • 时间:2015.8.1
  • 页码:1-7
  • 分类:O441.1[理学—电磁学;理学—物理] TB21[一般工业技术—工程设计测绘]
  • 作者机构:[1]State Key Laboratory of Tribology, Department of Mechanical Engineering, Tsinghua University, Beijing 100084, China
  • 相关基金:Project supported by the Ministry of Science and Technology of China (No. 2011 ZX02403), and the National Natural Science Foundation of China (No. 51175284).
  • 相关项目:模拟生物发育机制的快速设计方法及其在工艺腔室设计中的应用
中文摘要:

One of the core semiconductor devices is the electrostatic chuck.It has been widely used in plasmabased and vacuum-based semiconductor processing.The electrostatic chuck plays an important role in adsorbing and cooling/heating wafers,and has technical advantages on non-edge exclusion,high reliability,wafer planarity,particles reduction and so on.This article extracts key design elements from the existing knowledge and techniques of electrostatic chuck by the method proposed by Paul and Beitz,and establishes a design space systematically.The design space is composed of working objects,working principles and working structures.The working objects involve electrostatic chuck components and materials,classifications,and relevant properties;the working principles involve clamping force,residual force,and temperature control;the working structures describe how to compose an electrostatic chuck and to fulfill the overall functions.The systematic design space exhibits the main issues during electrostatic chuck design.The design space will facilitate and inspire designers to improve the design quality and shorten the design time in the conceptual design.

英文摘要:

One of the core semiconductor devices is the electrostatic chuck. It has been widely used in plasma- based and vacuum-based semiconductor processing. The electrostatic chuck plays an important role in adsorbing and cooling/heating wafers, and has technical advantages on non-edge exclusion, high reliability, wafer planarity, particles reduction and so on. This article extracts key design elements from the existing knowledge and techniques of electrostatic chuck by the method proposed by Paul and Beitz, and establishes a design space systematically. The design space is composed of working objects, working principles and working structures. The working objects in- volve electrostatic chuck components and materials, classifications, and relevant properties; the working principles involve clamping force, residual force, and temperature control; the working structures describe how to compose an electrostatic chuck and to fulfill the overall functions. The systematic design space exhibits the main issues during electrostatic chuck design. The design space will facilitate and inspire designers to improve the design quality and shorten the design time in the conceptual design.

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