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中文摘要：
采用射频反应磁控溅射工艺，以纯镍靶为靶材，在SnO2玻璃上制备电致变色NiOx薄膜。通过对薄膜X射线衍射（XRD）、X光电子能谱（XPS）、扫描隧道显微镜（STM）、循环伏安曲线及可见光透过率的测定，探讨了NiOx薄膜的电致变色性能和微观结构之间的关系，研究了热处理过程中的结构变化和表面形貌。测试表明该氧化镍薄膜具有良好的电致变色性能和阳极着色效应，以及较高的使用寿命。
英文摘要：
NiOx films were deposited on SnO2 glass substrate by R.F. magnetron sputtering using pure Ni as target. Through the XRD, XPS, STM, cyclic voltammetry and optical transmittance methods, the relations between electrochromic properties and microstructure are discussed and the structure evolution and surface pattern of the doped NiOx films during annealing were investigated. The experimental results show that the NiOx films have good electrochromic properties and the longer useful life.
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