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REACTION SIMULATION AND EXPERIMENT OF A Cl-2/Ar INDUCTIVELY COUPLED PLASMA FOR ETCHING OF SILICON
  • ISSN号：0218-625X
  • 期刊名称：Surface Review and Letters
  • 时间：2014.6
  • 页码：-
  • 相关项目：柔性微电子器件与系统基础研究
作者： Ge, Jie|Liu, Xuan|Yang, Yi|Song, Yixu|Ren, Tianling|
同期刊论文项目
柔性微电子器件与系统基础研究
期刊论文 85 会议论文 6 专利 1
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