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The thermal stability of atomic layer deposited HfLaOx: Material and electrical characterization
  • ISSN号：1567-1739
  • 期刊名称：Current Applied Physics
  • 时间：2012.11.11
  • 页码：1445-1447
  • 相关项目：碳基电路中的纳米尺度阻式存储稳定实现及物理机制
作者： Yang, Wen|Sun, Qing-Qing|Fang, Run-Chen|Chen, Lin|Zhou, Peng|Ding, Shi-Jin|Zhang, David Wei|
同期刊论文项目
碳基电路中的纳米尺度阻式存储稳定实现及物理机制
期刊论文 18 会议论文 1
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