以锆钛酸铅薄膜(PZT)为例,分析了国内外铁电薄膜退火的各种方法。针对解决铁电薄膜基底高温生长工艺与硅集成电路承受温度较低的不兼容及器件性质劣化的难题,分别对普通炉子退火、快速热退火及激光退火进行了详细的分析比较。激光低温退火技术有望成功地在未来应用PZT铁电薄膜制作组件时,增加其制备工艺设计的弹性和可行性。
Various annealing routes of ferroelectric thin films were analysed taking lead zirconate titanate (PZT) thin films as example in this paper. Classic furnace annealing, rapid thermal annealing and laser annealing were analysed to the problems of substrate interface diffusion and difficulties in integrating the films with silicon monolithic circuits. Laser annealing can be applied to increase the elasticity and feasibility in the fabrication of ferroelectric thin films device.