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中文摘要：
氩氟（ArF）浸没干涉光刻系统可产生高分辨周期图形,是研究高数值孔径ArF浸没光刻的有力工具。消色差ArF浸没干涉光刻系统能降低系统对曝光光源的相干性要求,实现高分辨率成像。提出了一种双液体层消色差浸没干涉光刻系统,由衍射理论和几何光学理论分析了系统的消色差原理和成像机制。对比传统的单液体层系统分析了其成像性能并分析其优点。结果表明,该系统的成像焦深和可分辨像场宽度较大且不依赖于激光光源的带宽;系统性能对外界环境不敏感,成像稳定性得到改善;该系统以简单的对称结构解决了干涉光刻成像中ArF准分子激光光源相干性差的问题,并保证了系统成像性能的稳定。
英文摘要：
ArF immersion interference lithography system can produce high resolution periodic pattern as a powerful tool for the study of hyper numerical aperture ArF immersion lithography.The coherence requirements on exposure source can be alleviated and high resolution imaging can be realized by the use of achromatic ArF immersion interference lithography system.A novel double-fluid-layer achromatic immersion interference lithography system is developed.The system′s achromatic principles and imaging mechanism are studied by using diffraction theory and principle of geometrical optics.The imaging performance is analyzed and the advantages are summarized compared with traditional single-fluid-layer system.The results indicate that this system enables a large depth of focus（DOF） and width of resolved imaging field which are independent of the bandwidth of laser.The system′s performance is insensitive to environment,so that the imaging stability is improved.The system employs simple symmetry structure to overcome the problem of poor coherence properties for ArF excimer lasers,and ensures stability of imaging performance in interference lithography.
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