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Effect of C:F Deposition on Etching of SiCOH Low-k Films in CHF3 60 MHz/2 MHz Dual-Frequency Capacit
  • 期刊名称：Plasma Science and Technology
  • 时间：0
  • 页码：437-441
  • 语言：英文
  • 相关项目：低气压多频等离子体与材料表面相互作用
作者： SHI Guofeng|YUAN Yuan|XU Yijun|HUANG Hongwei|YE Chao|NING Zhaoyuan|
同期刊论文项目
低气压多频等离子体与材料表面相互作用
期刊论文 80 会议论文 8
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