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单能质子辐射致质粒DNA链断裂的剂量效应

期刊名称：孔福全，王　潇，隋　丽，倪嵋楠，杨明建，赵　葵,单能质子辐射致质粒DNA链断裂的剂量效应,激光生物学
时间：0
分类：Q81[生物学—生物工程]
作者机构：[1]China Institute of Atomic Energy, Beijing 102413, China, [2]School of Science, Hebei University of Technology, Tianjin 300130, China, [3]Key Laboratory of Beam Technology and Modification of Ministry of Education of China, Beijing Normal University, Beijing 100875,China, [4]Handan College, Handan 056005, China
相关基金：Supported by the National Natural Science Foundation of China （Grant No. 10435020）
相关项目：低能离子辐射生物物理的基础研究

关键词：重离子, 质粒, DNA, Γ射线, heavy ions, plasmid DNA, DNA concentration, γ rays, strand break

中文摘要：

为了在 DNA 放射上在水溶液评估 DNA 集中的影响，损坏，原生质标志 DNA 当面或甘露糖醇的缺席(自由基的 scavenger 哦) 被 Li-7 离子和鲸鱼群妈光线在各种各样的 DNA 集中照耀。凝胶电泳分析表明单个、双的海滨裂缝的 DNA 损坏由照耀导致了在更低的 DNA 集中变得更严重。处于 gamma 光线照耀的条件，大多数裂缝(DSB ) 损坏的两倍海滨被抵销并且少些面对甘露糖醇把集中与 DNA 联系了。在 Li-7 照耀下面，然而， DSB 损坏不能被甘露糖醇清除，但是逐渐地与减少的 DNA 集中被加重。这些调查结果暗示那在下面低--让的照耀，大多数 DSB 损坏被自由基产生哦散开，并且，可以被 scavengers 因此抵抗在更高--让的照耀，相当很少的 DSB 正式就职被直接电离引起重离子的精力免职，它不能被消除。当 DNA 集中在某个价值(50 ng/mu L ) 下面时，这个工作也显示在自由基损坏和直接电离损坏之间的比例是独立于 DNA 集中的一个常数。我们的学习在 DNA 放射损坏过程使内在的机制清楚些。

英文摘要：

To evaluate the influence of the DNA concentration in the aqueous solution on DNA radiation damage, the plasmid DNA in the presence or absence of Mannitol （scavenger of free radical OH.） was irradiated by ^7Li ions and γ rays at various DNA concentrations. Gel electrophoresis analysis revealed that the DNA damage of single and double strand breaks induced by irradiation became more severe at lower DNA concentration. In the condition of γ-ray irradiation, most of double strand breaks （DSB） damage was neutralized and less associated with DNA concentration in the presence of mannitol. However, under ^7Li irradiation, DSB damage could not be cleared by mannitol but was gradually aggravated with decreasing DNA concentrations. These findings imply that under low-LET irradiation, most of the DSB damage is generated by free radical OH·diffusion, and thus may be counteracted by scavengers, while at higher-LET irradiation, quite a fraction of DSB induction is caused by direct ionizing energy deposition of heavy ions, which cannot be eliminated. This work also indicates that the proportion between free radical damage and direct ionizing damage is s constant which is independent of DNA concentration when the DNA concentration is under a certain value （50ng/μL）. Our study sheds light on the un- derlying mechanisms in the DNA radiation damage process.

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