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A novel sensitivity model for short nets
  • 期刊名称:Chinese Physics B
  • 时间:2012
  • 页码:98503-98512
  • 分类:TS143.223[轻工技术与工程—纺织材料与纺织品设计;轻工技术与工程—纺织科学与工程] TK477[动力工程及工程热物理—动力机械及工程]
  • 作者机构:[1]School of Communication Engineering, Xidian University, Xi'an 710071, China, [2]Microelectronics Institute, Xidian University, Xi'an 710071, China
  • 相关基金:Project supported by the National Natural Science Foundation of China (Grant Nos. 61173088 and 61070143) and the Programme of Introducing Talents of Discipline to Universities (Grant No. B08038)
  • 相关项目:基于随机缺陷的版图布线优化算法研究
中文摘要:

For modern processes at deep sub-micron technology nodes, yield design, especially the design at the layout stage is an important way to deal with the problem of manufacturability and yield. In order to reduce the yield loss caused by redundancy material defects, the choice of nets to be optimized at first is an important step in the process of layout optimization. This paper provides a new sensitivity model for a short net, which is net-based and reflects the size of the critical area between a single net and the nets around it. Since this model is based on a single net and includes the information of the surrounding nets, the critical area between the single net and surrounding nets can be reduced at the same time. In this way, the efficiency of layout optimization becomes higher. According to experimental observations, this sensitivity model can be used to choose the position for optimization. Compared with the chip-area-based and basic- layout-based sensitivity models, our sensitivity model not only has higher efficiency, but also confirms that choosing the net to be optimized at first improves the design.

英文摘要:

For modern processes at deep sub-micron technology nodes, yield design, especially the design at the layout stage is an important way to deal with the problem of manufacturability and yield. In order to reduce the yield loss caused by redundancy material defects, the choice of nets to be optimized at first is an important step in the process of layout optimization. This paper provides a new sensitivity model for a short net, which is net-based and reflects the size of the critical area between a single net and the nets around it. Since this model is based on a single net and includes the information of the surrounding nets, the critical area between the single net and surrounding nets can be reduced at the same time. In this way, the efficiency of layout optimization becomes higher. According to experimental observations~ this sensitivity model can be used to choose the position for optimization. Compared with the chip-area-based and basic- layout-based sensitivity models, our sensitivity model not only has higher efficiency, but also confirms that choosing the net to be optimized at first improves the design.

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