中文摘要：

采用电子束蒸发技术及其辅助工艺制备了TiO2薄膜,利用X射线衍射（XRD）、X射线光电子能谱（XPS）和原子力显微镜（AFM）对薄膜的组织结构进行了表征,采用紫外可见分光光度计研究了TiO2薄膜的折射率变化.结果表明：传统电子束蒸发镀制的TiO2薄膜的折射率低于块体值,通过调节氧气压、沉积速率和衬底温度可在1.97～2.22范围内调控其折射率;采用离子束辅助轰击可使薄膜致密化,获得折射率在2.06～2.42范围内变化的TiO2薄膜;利用斜角入射沉积可控制薄膜生长角度与孔隙率,实现折射率在1.71～2.18范围内的调控.

英文摘要：

TiO2 films were prepared by electron beam evaporation（E-beam）.X-ray diffraction（XRD）,X-ray photoelectron spectroscopy（XPS） and atomic force microscope（AFM） were applied to characterize the film＇s structure.UV-visible spectrophotometer was used to analyze the changes of refractive index（RI）.It has been found that the RI of TiO2 film prepared by E-beam is lower than that of the bulk.It can be regulated within 1.97~2.22 by controlling O2 pressure,deposition rate and substrate temperature.Compact film with RI within 2.06~2.42 is obtained by ion beam assisted deposition.Glancing angle deposition can realize the regulation of RI within 1.71~2.18 by controlling the growing angle and the porosity of films.